Selective placement of carbon nanotubes on oxide surfaces

ABSTRACT

The present invention provides a method for the selective placement of carbon nanotubes on a particular surface. In particular, the present invention provides a method in which self-assembled monolayers formed on an unpatterned or patterned metal oxide surface are used to attract or repel carbon nanotubes from a dispersion containing the same. In accordance with the present invention, the carbon nanotubes can be attracted to the self-assembled monolayers so as to be attached to the metal oxide surface, or they can be repelled by the self-assembled monolayers bonding to a predetermined surface other than the metal oxide surface containing the self-assembled monolayers.

RELATED APPLICATION

This application is a continuation of U.S. patent application Ser. No.11/044,885, filed Jan. 27, 2005, now U.S. Pat. No. 7,504,132.

FIELD OF THE INVENTION

The present invention generally relates to the selective placement ofcarbon nanotubes on a particular surface. More particularly, the presentinvention provides a method in which self-assembled monolayers formed ona particular surface are used to attract or repel carbon nanotubes froma dispersion containing the same. The present invention also relates tothe use of self-assembled monolayers of phosphonic acid on oxidesurfaces for the selective placement of carbon nanotubes (CNTs).

BACKGROUND OF THE INVENTION

In the field of molecular electronics, few materials show as muchpromise as carbon nanotubes that comprise hollow cylinders of graphitethat have a diameter of a few Angstroms. Nanotubes can be implemented inelectronic devices, such as, for example, diodes and transistors,depending on the characteristics of the nanotube. Nanotubes are uniquefor their size, shape and physical properties. For example, carbon basednanotubes resemble a hexagonal lattice of carbon rolled into a cylinder.

Besides exhibiting intriguing quantum behaviors even at roomtemperature, nanotubes exhibit at least two important characteristics: ananotube can be either metallic or semiconducting depending on itschirality, i.e., conformational geometry. Metallic nanotubes can carryan extremely large current density with constant resistivity.Semiconducting nanotubes can be electrically switched “on” or “off” asfield effect transistors (FETs). Typically, semiconducting carbonnanotubes are used as the ‘channel’ in FETs. The two types may becovalently joined (i.e., sharing electrons). These characteristics pointto nanotubes as excellent materials for making nanometer sizedsemiconductor circuits.

The most common prior art method of fabricating carbon nanotube FETsstarts with depositing nanotubes on an oxide thin film from a liquidsuspension. Source and drain contacts are then formed lithographicallyon the nanotube. The oxide layer is the gate dielectric, and the bulk Siback-gates the device. A schematic of a typical prior art carbonnanotube FET is shown, for example, in FIG. 1.

The deposition of carbon nanotubes on an oxide surface, followed bylithographic patterning of the source and drain contacts, has beensuccessfully used in the prior art for the construction of single carbonnanotube FETs. However, fabrication of integrated circuits fromnanotubes requires the precise placement and alignment of large numbersof carbon nanotubes on a surface (e.g., spanning the source and draincontacts). E. Valentin, et al., “High-density selective placementmethods for carbon nanotubes”, Microelectronic Engineering, 61-62(2002), pp. 491-496 disclose a method in which the adhesion of carbonnanotubes onto a SiO₂ surface is improved usingaminopropyltriethoxysilane (APTS). In this prior art, APTS is employedto form a silanized surface on SiO₂ which is then used to selectivelyplace the carbon nanotubes.

As known to those skilled in the art, SiO₂ and other oxides ofnon-metals are acidic oxides which form acids when combined with water.Such oxides are known to have low isoelectric points. The term“isoelectric point” is used throughout the present application to denotethe pH at which the net charge on the oxide molecule is zero.

A drawback with the prior art process disclosed in the E. Valentin, etal. article is that the trialkoxysilane undergoes polymerization insolution and self-assembly must be carried out under controlledconditions excluding water. Additionally, APTS cannot be printed usingconventional poly(dimethylsiloxane) (PDMS) stamps in contact printingbecause the solvents that are used for APTS could swell and destroy suchstamps.

In view of the above, there is still a need for providing a method inwhich carbon nanotubes can be selectively placed which avoids thedrawbacks with the selective placement process described in the priorart in which APTS is employed.

SUMMARY OF THE INVENTION

The present invention provides a method in which carbon nanotubes can beselectively placed on a predetermined surface that avoids the problemswith the prior art APTS selective placement process which is mentionedin the background section of this application. In particular, thepresent invention provides a method in which self-assembled monolayersformed on a metal oxide surface (patterned or unpatterned) are used toattract or repel carbon nanotubes from a dispersion containing the same.In accordance with the present invention, the carbon nanotubes can beattracted to the self-assembled monolayers so as to be attached to themetal oxide surface, or they can be repelled by the self-assembledmonolayers bonding to a predetermined surface other than the metal oxidesurface containing the self-assembled monolayers. The method of thepresent invention does not include the formation of a silanized surfacefor forming the carbon nanotubes, as is the case in the prior artmentioned above. Instead, non-silylating monolayer precursors areemployed for forming a non-silanized self-assembled monolayer.

In broad terms, the method of the present invention includes the stepsof:

-   selectively placing a self-assembled monolayer on an upper metal    oxide surface of a substrate;-   depositing carbon nanotubes from a dispersion on said self-assembled    monolayer or on a surface of said substrate not containing said    self-assembled monolayer; and-   removing excess carbon nanotubes from said substrate.

The substrate of the present invention can include a metal oxidesubstrate or a non-metal oxide substrate such as SiO₂ which includes apatterned metal oxide layer located thereon. The self-assembledmonolayers used in the present invention typically comprise monolayerprecursors not including silyl groups such as, for example, organicphosphonic acids that include at least a phosphonic acid group (—PO₃H₂)which bonds to a metal oxide surface. The monolayers formed using theseprecursors do not include a silanized surface for selective carbonnanotube placement. In addition to organic phosphonic acids, the presentinvention also contemplates the use of organic hydroxamic acids as themonolayer precursor. The term “self-assembled monolayer precursor” isused throughout the present application to denote compounds that canform highly packed monolayers on a particular surface by electrostaticor covalent bonding to said surface.

One embodiment of the present invention relates to the selectiveplacement of carbon nanotubes by prepatterning a metal oxide substratewith a self-assembled monolayer in such a way (e.g., microcontactprinting) that a predetermined area is not coated with theself-assembled monolayer. Later, carbon nanotubes are formed in thepredetermined area by depositing, through immersion or drop-casting froma solution.

Another embodiment of the present invention is the selective placementof carbon nanotubes on a metal oxide surface in a predetermined area ofa substrate by selectively coating the predetermined area with aself-assembled monolayer and later immersing the substrate in adispersion of carbon nanotubes. In this instance, carbon nanotubes areonly formed on areas where the self-assembled monolayer is present.Still another embodiment of this invention is to prepattern the surfaceof an acidic oxide substrate such as silicon oxide with a metal oxidesuch as aluminum oxide or hafnium oxide such that a predeterminedsurface of the substrate is exposed. The substrate is then immersed in asolution capable of forming a self-assembled monolayer whereupon theself-assembled monolayer is only formed on the metal oxide. Solutiondeposition of carbon nanotubes results in placement of carbon nanotubesin the predetermined (silicon oxide) area of the substrate.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a pictorial representation (through a cross sectional view)illustrating a prior art back-gated field effect transistor.

FIGS. 2A-2D are pictorial representations (through cross sectionalviews) illustrating a first embodiment of the present invention in whicha microprinting scheme is used for the selective placement of carbonnanotubes.

FIG. 3 is a SEM image of a 5.3 nm thick HfO₂ surface stamped with HDPA,following nanotube deposition using the technique illustrated in FIGS.2A-2D.

FIGS. 4A-4F are pictorial representations (through cross sectional view)illustrating a second embodiment of the present invention in which apatterned substrate scheme is used for the selective placement of carbonnanotubes.

FIG. 5 is a SEM of patterned Al₂O₃ lines on SiO₂ that was prepared usingthe scheme illustrated in FIGS. 4A-4F.

FIGS. 6A-6F are pictorial representations (through cross sectionalviews) illustrating a third embodiment of the present invention which issimilar to the second embodiment except that the carbon nanotubes areattracted to a treated surface instead of the untreated surface as shownin FIGS. 4A-4F.

FIG. 7 is an atomic-force microscopy (AFM) image of patterned Al₂O₃lines on SiO₂ that was prepared using the scheme illustrated in FIGS.6A-6F.

DETAILED DESCRIPTION OF THE INVENTION

The present invention, which provides a selective placement method forcarbon nanotubes, will now be described in greater detail by referringto the drawings that accompany the present application. It is noted thatthe cross sectional views which illustrate various processingembodiments of the present invention are provided for illustrativepurposes and thus they are not drawn to scale.

As stated above, the present invention provides a method whereby carbonnanotubes can be selectively placed on predetermined surfaces of asubstrate. In particular, the present invention provides a method inwhich self-assembled monolayers formed on an unpatterned or patternedmetal oxide surface are used to attract or repel carbon nanotubes from adispersion containing the same. In accordance with the presentinvention, the carbon nanotubes can be attracted to the self-assembledmonolayers so as to be attached to the metal oxide surface, or they canbe repelled by the self-assembled monolayers bonding to a predeterminedsurface other than the metal oxide surface containing the self-assembledmonolayers.

The term “carbon nanotube” is used throughout the present application toinclude a one-dimensional nanomaterial that has a hollow cavity withnanometer-sized diameters and much, much longer lengths. In other words,the carbon nanotubes have a high aspect ratio and quantum effects becomeimportant for these systems. The nanotubes that can be used in thepresent invention are single walled or multi-walled nanomaterials thattypically have an outer diameter that is typically from about 0.8 nm toabout 30 nm, with an outer diameter from about 1.0 nm to about 2.5 nmbeing more typical, and a length that is typically from about 5 nm toabout 100 μm, with a length from about 10 nm to about 10 μm being moretypical. In addition to having an outer diameter, the nanotubes that canbe used in the present invention have an inner diameter that istypically from about 0.8 nm to about 15 nm, with an inner diameter fromabout 0.8 nm to about 2.5 nm being more highly typical. The nanotubesuseful in the present invention are further characterized as having ahigh aspect ratio that is typically on the order of about 5 or greater,with an aspect ratio from about 5 to about 5000 being typical.

The nanotubes formed include a C-based nanomaterial that has a hexagonallattice structure that is rolled up.

The carbon nanotubes used in the present invention are made usingtechniques well known to those skilled in the art. For example, thecarbon nanotubes can be formed by laser ablation, chemical vapordeposition (CVD) of various organic materials, such as carbon monoxide,methane, and ethanol, and electrical discharge.

Reference is first made to FIGS. 2A-2D which show one embodiment of thepresent invention. In the embodiment illustrated, a microprinting schemeis used for the selective placement of carbon nanotubes. Specifically, ametal oxide 10 is patterned with a self-assembled monolayer 12′ usingmicrocontact printing in which a stamp 14 containing the self-assembledmonolayer 12 is used to the transfer self-assembled monolayer from thestamp to the metal oxide. FIG. 2A shows the initial sequence in which astamp 14 containing the self-assembled monolayer 12 is provided and isbrought into contact with a metal oxide 10 that includes at least onemetal from group IVB, VB, VIIB, VIIB, VIII or IIA (CAS version) of thePeriodic Table of Elements. Illustratively, the metal oxide may compriseAl₂O₃, HfO₂, TiO₂, or ZrO₂. The metal oxide 10 may be located atopanother dielectric material or a semiconducting material.

The stamp 14 is a patterned structure that is comprised of aconventional stamp material that can be inked with the self-assembledmonolayer 12. Typically, the stamp 14 is comprised ofpoly(dimethylsiloxane), PDMS. The stamp 14 minus the self-assembledmonolayer 12 is fabricated using techniques well known to those skilledin the microprinting art.

The self-assembled monolayer 12 is applied to the stamp 14 using aconventional inking process. Typically, the stamp 14 is inked with amonolayer precursor that is capable of (i) forming a self-assembledmonolayer 12 on the surface of the stamp, (ii) forming a bond with basicoxides, e.g., metal oxides that have a high isoelectric point, and (iii)repelling carbon nanotube adhesion to the surface containing the same.Illustratively, one precursor material that satisfies criteria (i)-(iii)includes phosphonic acids that have the structural formula R—PO₃H₂,wherein R is an alkyl group containing from 1 to about 22, preferablyfrom 1 to about 16 carbon atoms, or R is an aromatic or heteroaromaticcontaining from 1 to 12, preferably from 3 to 6, rings. Theheteroaromatics can include one of the following as the heteroatom;nitrogen, sulfur, oxygen or combinations thereof. The aromatic orheteroaromatic may be substituted in some instances with an alkyl(straight chain or branched) containing from 1 to about 22 carbon atoms.More typically, the self-assembled monolayer 12 is comprised of analkylphosphonic acid such as, for example, hexadecylphosphonic acid.

Another precursor material that satisfies criteria (i)-(iii) includes ahydroxamic acid of the general formula R¹—CONHOH wherein R¹ is an alkylgroup containing from 1 to about 22, preferably from 1 to about 16carbon atoms, or R¹ is an aromatic or heteroaromatic containing from 1to 12, preferably 3 to 6, rings. The heteroaromatics can include one ofthe following as the heteroatom: nitrogen, sulfur, oxygen orcombinations thereof. The aromatic or heteroaromatic may be substitutedin some cases with an alkyl (straight chain or branched) containing 1 toabout 22 carbon atoms. More typically, the self-assembled monolayer 12is comprised of an alkylhydroxamic acid such as, for example,hexadecylhydroxamic acid.

It is noted that the present invention does not contemplate usingsilylation chemistry as is disclosed in the article to E. Valentindescribed in the background section of the present invention for theselective placement of carbon nanotubes.

The self-assembled monolayer 12 is formed onto the stamp 14 by applying,i.e., inking, a solution containing one of the above mentionedself-assembled monolayer precursors onto the stamp 14. The solutiontypically includes a sufficient concentration of the self-assembledmonolayer precursor that is capable of forming said monolayer.Typically, from about 0.5 to about 50 mM, preferably from about 1 toabout 10 mM, of said self-assembled monolayer precursor is present inthe solution. The solution also contains at least a solvent that iscapable of dissolving the self-assembled monolayer precursor. Thesolvent may comprise an alcohol such as, for example, isopropyl alcohol.Other solvents that can be used for dissolving the self-assembledmonolayer precursor include hexane, toluene, chlorinated hydrocarbonsand ethers. The inked stamp shown in FIG. 2A is typically dried with astream of an inert gas such as He, Ar, Ne or N₂.

After inking the stamp 14 with the self-assembled monolayer precursor,the stamp 14 is then brought into intimate contact with the metal oxide10. That is, the oxide surface is stamped with the stamp to transfer thepattern, e.g., the self-assembled monolayer 12. The structure that isformed after the pattern has been transferred from the stamp 14 to themetal oxide 10 is shown in FIG. 2B. The metal oxide 10 containing theself-assembled monolayer 12′ is then heated under conditions that arecapable of drying the self-assembled monolayer 12′. Typically, theheating is performed at a temperature from about 80° C. to about 120° C.for a time period from about 1 minute to about 5 minutes. Moretypically, this heating step is performed at a temperature of about 110°C. for about 2 minutes.

FIG. 2C shows the next processing step in which a dispersion 17 ofcarbon nanotubes 18 in a solvent is applied to the structure shown inFIG. 23. The dispersion 17 of carbon nanotubes 18 is prepared usingtechniques that are well known in the art. Typically, the dispersion 17of carbon nanotubes 18 is prepared by sonication of carbon nanotubes inan organic solvent (such as, for example, dichloroethylene,N-methylpyrolidone or dichloromethane) or in an aqueous solution thatcontains from about 0.1 to about 1% of a surfactant. Examples ofsurfactants that can be used in preparing the aqueous dispersion ofcarbon nanotubes include dodecylbenzenesulfonic acid sodium salt (DDS)and poly(oxyethylene)-substituted aromatic compounds such as TritonN-100 or Triton X-100.

As shown in FIG. 2D of this embodiment of the present invention, thecarbon nanotubes 18 are repelled by the self-assembled monolayer 12′ andare deposited on the surface of the metal oxide 10 that does not includethe self-assembled monolayer 12′. After deposition of the carbonnanotubes 18 onto the surface of the metal oxide 10 not including theself-assembled monolayer 12′, any excess carbon nanotube is removed byrinsing the structure with an organic solvent such as dichloroethylenethat is capable of dissolving carbon nanotubes that are not attached tothe metal oxide 10. The sample may be mildly agitated to remove any CNTson the previously stamped area. The above processing scheme leads todeposition of carbon nanotubes 18 on the area of the substrate 10 thatwas not stamped. Example 1 and FIG. 3 also correspond to this embodimentof the present invention.

Following deposition of the carbon nanotubes, device fabrication can beperformed utilizing standard techniques well known in the art includinglithography and metal deposition.

The second method of the present invention exploits the selectivebinding of the self-assembled monolayer precursor to metal oxides. Thisembodiment of the present invention, which is shown in FIG. 4A-4F,permits carbon nanotube FET fabrication on standard SiO₂ dielectriclayers. Specifically, this embodiment begins with providing a substrate20 that comprises an acidic oxide such as SiO₂ or other any non-basicoxide substrate. This is shown in FIG. 4A. Next, and as shown in FIG. 4Ba patterned basic oxide 22, i.e., metal oxide, having at least oneopening 23 is formed on a surface of the substrate 20. The patternedbasic oxide is formed by a conventional deposition process such as, forexample, chemical vapor deposition (CVD), plasma enhanced chemical vapordeposition (PECVD), evaporation, solution deposition, metalorganodeposition or atomic layer deposition. The thickness of the basic oxidelayer is not critical to the present application. After deposition,standard lithography is used to create at least one opening in the basicoxide layer that exposes the underlying substrate 20. Alternatively, thepatterned basic oxide 22 (herein after patterned metal oxide 22) can beformed using a patterned mask during the deposition of the metal oxide.

FIGS. 4C and 4D illustrate the structure during and after the formationof a self-assembled monolayer 12′ on the surface of the patterned basicoxide 22, respectively. Specifically, FIG. 4C shows the structure duringthe application of a solution 21 containing the self-assembled monolayerprecursor 12. The solution 21 including the self-assembled monolayerprecursor and solvent is the same as described in the first embodimentof the present invention for inking the stamp. The application istypically performed by soaking the structure of FIG. 4B in said solutionfor a period of time from about 2 hours to about 24 hours. In thisembodiment, and as shown in FIG. 4D, the self-assembled monolayer 12′binds only onto the metal oxide surfaces 22 and not onto the exposedsurface of the substrate 20.

FIGS. 4E and 4F shows the structure during and after the formation ofcarbon nanotubes 18 onto the exposed surface of substrate 20. Nanotubedispersion is carried out as described in the first embodiment of thepresent invention. The resulting structure includes carbon nanotubes 18formed on the exposed surface of the substrate 20. Example 2 and FIG. 5also correspond to this embodiment of the present invention.

It is noted that the two schemes described above may be considered asnegative patterning in which the carbon nanotubes do not bind to thearea where highly hydrophobic self-assembled monolayers are present. Ifhowever, the self-assembled monolayer is terminated with a functionalitythat has affinity for carbon nanotubes such as an amine, carbon nanotubeadsorption can be promoted rather than prevented. This embodiment of thepresent invention is shown in FIGS. 6A-6F. This embodiment of thepresent invention begins by first providing the structure shown in FIG.6A. This structure comprises a substrate 20 that includes a non-basicoxide such as an acid oxide. Next, and as shown in FIG. 6B, a patternedmetal oxide 22 having at least one opening 23 is formed on the surfaceof substrate 20 such that a surface portion of substrate 20 is exposed.The formation of the patterned metal oxide 22 shown in FIG. 6B is thesame as described above in the second embodiment of the presentinvention. FIGS. 6C and 6D show the structure during and aftercontacting with a solution 17 containing a self-assembled monolayerprecursor 12. Unlike the previous examples in which the self-assembledmonolayer was hydrophobic, this example uses self-assembled monolayerprecursors that contain a functionality which can react (or attract) thecarbon nanotubes. In this embodiment, the self-assembled monolayerprecursors comprise a compound of the following formula X—R²—Z where Xis a phosphonic acid group (—PO₃H₂) or a hydroxamic acid group(—CONHOH), Z is —NH₂, NHNH₂, —ONH₂, —ONHOH or —Ar(aromatic)-N⁺ and R² isa straight chain alkyl containing from 1 to 22, a —(CH₂)_(n) moiety inwhich n is from 3 to 21, alkoxy groups such as (CH₂O)_(x) where x isfrom 3 to 21, aryl groups containing one to six phenyl, pyridyl, orthienyl groups, or mixed alkyl-aryl groups. A preferred precursor forthis embodiment of the present invention is an aminoalkylphosphonic acidsuch as aminobutylphosphonic acid (ABPA). The solution 17 containing theself-assembled monolayer precursor includes a solvent as described inthe second embodiment and it is applied as described above.

FIGS. 6E and 6F shows the structure during and after the formation ofcarbon nanotubes 18 onto the exposed surface of substrate 20. Nanotubedispersion is carried out as described in the first embodiment of thepresent invention. The resulting structure includes carbon nanotubesformed on the surface of the self-assembled monolayer 12′. In thisembodiment, the carbon nanotubes are not formed onto the exposed surfaceof the substrate 20 since they react or are attracted to theself-assembled monolayer 12′. Example 3 and FIG. 7 also correspond tothis embodiment of the present invention.

The following examples are provided to illustrate the various processingschemes of the present invention for the selective placement of carbonnanotubes.

EXAMPLE 1

A silicon wafer was coated with 100 nm of hafnium oxide by vacuumevaporation. A poly(dimethoxysilane) (PDMS) stamp with prepatternedfeatures (indentations) was soaked with a 5 mM solution ofhexadecylphosphonic acid in isopropyl alcohol and dried with stream ofnitrogen. The PDMS stamp was then pressed against the substrate withhafnium oxide surface and held for few seconds, and then heated at 100°C. for one minute. The stamped substrate was then coated with adispersion of carbon nanotubes in dichloroethylene and dried understream of nitrogen. The substrate was then immersed in dichloroethyleneand agitated mildly to remove any carbon nanotubes on the stamped area.This process lead to deposition of carbon nanotubes only on area of thesubstrate which was not stamped (exposed hafnium oxide surface) as shownin FIG. 3. No nanotube formation was observed in the stamped area.

EXAMPLE 2

A silicon wafer with 100 nm of silicon oxide on the surface waspatterned with 10 nm of aluminum oxide by evaporation through a shadowmask. The substrate was then immersed in a 5 mM solution ofhexadecylphosphonic acid in ethanol. After 2 hours, the substrate wasremoved from the solution and washed with ethanol and dried at 100° C.for one minute. A dispersion of carbon nanotubes in dichloroethylene wasdeposited on the substrate and dried under stream of nitrogen. Thesubstrate was then washed with the solvent and dried at roomtemperature. In this example, carbon nanotubes were deposited on exposedsilicon dioxide surface as shown in FIG. 5. In this example, the carbonnanotubes adhered to the cleaned SiO₂ surface and not to the treatedAl₂O₃.

EXAMPLE 3

A silicon wafer with 100 nm of silicon oxide on the surface waspatterned, via standard lithography, with a 9 nm aluminum layer. Thealuminum layer was then oxidized in an oxygen plasma. The sample wasplaced in a dilute (4 mM in methanol) 4-aminobutylphosphonic acid (ABPA)solution for several days. The ABPA binds only to the Al₂O₃ and not tothe SiO₂. The sample was then placed in a suspension of carbon nanotubesin surfactant Triton-X and water for 4 hours. The substrate was removedfrom the solution and washed with excess solvent. Examination of thesubstrate shows that carbon nanotubes were found mainly on the areaswhere ABPA binds, that is, on the Al₂O₃ patterned lines (FIG. 7). Thesurrounding SiO₂ showed a very low density of carbon nanotubes oramorphous carbon.

While the present invention has been particularly shown and describedwith respect to preferred embodiments thereof, it will be understood bythose skilled in the art that the foregoing and other changes in formsand details may be made without departing from the spirit and scope ofthe present invention. It is therefore intended that the presentinvention not be limited to the exact forms and details described andillustrated, but fall within the scope of the appended claims.

1. A method of selective placement of carbon nanotubes on apredetermined surface comprising: selectively placing without utilizingsilylation chemistry a self-assembled monolayer on an upper metal oxidesurface of a substrate; depositing carbon nanotubes from a dispersion onsaid self-assembled monolayer or on a surface of said substrate notcontaining said self-assembled monolayer; and removing excess carbonnanotubes from said substrate.
 2. The method of claim 1 wherein saidsubstrate is comprised of a metal oxide that is unpatterned.
 3. Themethod of claim 2 wherein said selectively placing of saidself-assembled monolayer comprises providing a stamp containing apattern of said self-assembled monolayer and transferring said patternof said self-assembled monolayer to said metal oxide.
 4. The method ofclaim 3 wherein said self-assembled monolayer comprises a phosphonicacid having the formula R—PO₃H₂, wherein R is an alkyl group containingfrom 1 to about 22 or R is an aromatic or hetero aromatic containingfrom 1 to 12 rings or a hydroxamic acid of the general formula R¹—CONHOHwherein R¹ is an alkyl group containing from 1 to about 22, or R¹ is anaromatic or heteroaromatic containing from 1 to 12 rings.
 5. The methodof claim 4 wherein said monolayer comprises a phosphonic acid.
 6. Themethod of claim 5 wherein said phosphonic acid is hexadecylphosphonicacid.
 7. The method of claim 4 wherein said monolayer comprises ahydroxamic acid.
 8. The method of claim 7 wherein said alkylhydroxamicacid is hexadecylhydroxamic acid.
 9. The method of claim 3 wherein saiddepositing of carbon nanotubes occurs on an area of said metal oxidethat is not stamped with said self-assembled monolayer.
 10. The methodof claim 9 wherein said depositing of carbon nanotubes is performedusing a dispersion containing said carbon nanotubes.
 11. The method ofclaim 10 wherein said dispersion includes an organic solvent or aaqueous solvent and a surfactant.
 12. The method of claim 1 wherein saidupper metal oxide surface comprises a patterned metal oxide located onsaid substrate.
 13. The method of claim 12 wherein said selectivelyplacing of said self-assembled monolayer is performed using a solutioncontaining a self-assembled monolayer precursor.
 14. The method of claim13 wherein said self-assembled monolayer precursor comprises aphosphonic acid having the formula R—PO₃H₂, wherein R is an alkyl groupcontaining from 1 to about 22 or R is an aromatic or heteroaromaticcontaining from 1 to 12 rings or a hydroxamic acid of the generalformula R¹—CONHOH wherein R¹ is an alkyl group containing from 1 toabout 22, or R¹ is an aromatic or heteroaromatic containing from 1 to 12rings.
 15. The method of claim 14 wherein said monolayer precursorcomprises a phosphonic acid.
 16. The method of claim 15 wherein saidphosphonic acid is hexadecylphosphonic acid.
 17. The method of claim 14wherein said monolayer precursor comprises a hydroxamic acid.
 18. Themethod of claim 17 wherein said hydroxamic acid is hexadecylhydroxamicacid.
 19. The method of claim 13 wherein said depositing of carbonnanotubes occurs on an area of said substrate not including saidself-assembled monolayer.
 20. The method of claim 19 wherein saiddepositing of carbon nanotubes is performed using a dispersioncontaining said carbon nanotubes.
 21. The method of claim 20 whereinsaid dispersion includes an organic solvent or a aqueous solvent and asurfactant.
 22. The method of claim 13 wherein said self-assembledmonolayer precursor comprises a compound of the following formula X—R²—Zwhere X is a phosphonic acid group or a hydroxamic acid group, Z is—NH₂, NHNH₂, —ONH₂, —ONHOH or —Ar—N⁺ and R² is a straight chain alkylcontaining from 1 to 22, a —(CH₂)_(n) moiety in which n is from 3 to 21,alkoxy groups such as (CH₂O)_(x) where x is from 3 to 21, aryl groupscontaining one to six phenyl, pyridyl, or thienyl groups, or mixedalkyl-aryl groups.
 23. The method of claim 22 wherein said compound isaminobutylphosphonic acid (ABPA).
 24. The method of claim 22 whereinsaid depositing of carbon nanotubes occurs on a surface of saidself-assembled monolayer.
 25. The method of claim 24 wherein saiddepositing of carbon nanotubes is performed using a dispersioncontaining said carbon nanotubes.
 26. The method of claim 25 whereinsaid dispersion includes an organic solvent or a aqueous solvent and asurfactant.
 27. A method of selective placement of carbon nanotubes on apredetermined surface comprising: selectively placing without the use ofsilylation chemistry a self-assembled monolayer on a metal oxide usingmicrocontact printing from a patterned stamp containing saidself-assembled monolayer; depositing carbon nanotubes from a dispersionon said metal oxide not containing said self-assembled monolayer; andremoving excess carbon nanotubes from said substrate.
 28. A method ofselective placement of carbon nanotubes on a predetermined surfacecomprising: selectively placing without utilizing silylation chemistry aself-assembled monolayer on a patterned metal oxide that includes atleast one opening that exposes a surface of the substrate; depositingcarbon nanotubes from a dispersion on said self-assembled monolayer oron a surface of said substrate not containing said self-assembledmonolayer; and removing excess carbon nanotubes from said substrate.